Vadim Yevgenyevich Banine

This inventor holds 193 USPTO granted patents and 28 published patent applications, plus 3 CIPO patents and 45 EPO patents, primarily in Lithography Technology (CPC class B82Y10-00). Top assignees: Asml Netherlands B.v., Carl-Zeiss-Smt Ag, Carl Zeiss Smt Gmbh. Active years: 2002-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vadim Yevgenyevich Banine. Retrieved from https://idiyas.com/inventor/vadim-yevgenyevich-banine

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 193 (Patent Applications = 28)

% Patents Active = 58.0

CIPO Patents = 3 (Patent Applications = 2)

EPO Patents = 45 (Patent Applications = 40)

Average Co-Inventor Count = 4.5

ph-index = 16

Forward Citations = 1,117(Granted Patents)

Forward Citations (Not Self Cited) = 921(Dec 10, 2025)

Inventors with similar research interests:

🔬 See more inventors

Location History:

NL-5704 NK Helmond, NL (2003)
Eendracht, NL (2014)
Deume, NL (2013 - 2015)
SB Deurne, NL (2016)
Helmond, NL (2002 - 2018)
Veldhoven, NL (2017 - 2020)
Deurne, NL (2011 - 2021)

Company Filing History:

190 out of 5,080

Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

patents

5. 1 out of 2

Asml Lithography B.v.

patents

6. 1 out of 4

Stichting Nationaal Lucht-En Ruimtevaart Laboratorium

patents

7. 2 out of 834,601

Other

patents

where one patent can have more than one assignee

Years Active: 2002-2026

Loading Chart...

Areas of Expertise:

Lithographic Apparatus

Metrology Methods

Radiation Source

Patterning Device

EUV Lithography

Optical Element

Graphene Filter

Pellicle

Device Manufacturing

Imprint Lithography

Radiation Sensor

Grazing Incidence Reflectors

193 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12693592 - Pellicle membrane for a lithographic apparatus (2026-07-28),

2. 12117736 - Lithographic apparatus (2024-10-15),

3. 11143975 - Lithographic apparatus comprising an object with an upper layer having improved resistance to peeling off (2021-10-12),

4. 11048180 - Component for use in a patterning device environment (2021-06-29),

5. 10976196 - Sensor mark and a method of manufacturing a sensor mark (2021-04-13),

6. 10900829 - Radiation sensor apparatus (2021-01-26),

7. 10884339 - Lithographic method (2021-01-05),

8. 10712678 - Imprint lithography apparatus and method (2020-07-14),

9. 10698312 - Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane (2020-06-30),

10. 10678140 - Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter (2020-06-09),

11. 10580545 - Beam delivery apparatus and method (2020-03-03),

12. 10555407 - Metrology methods, radiation source, metrology apparatus and device manufacturing method (2020-02-04),

13. 10481510 - Graphene spectral purity filter (2019-11-19),

14. 10422691 - Radiation sensor apparatus (2019-09-24),

15. 10362665 - Methods and apparatus for optical metrology (2019-07-23),

Title: Vadim Yevgenyevich Banine: A Creative Mind in the World of Lithography

Introduction:

Vadim Yevgenyevich Banine, a brilliant inventor and prolific patent holder, has made significant contributions to the field of lithography. Hailing from Helmond, NL, Banine's inventive genius has resulted in an impressive 191 patents to his name. Let us delve into his latest patents, career highlights, notable collaborations, and marvel at the remarkable innovations he has brought to the industry.

Latest Patents:

1. Lithographic apparatus comprising an object with an upper layer having improved resistance to peeling off: Banine's invention focuses on enhancing the bond strength between layers within lithographic apparatus, resulting in improved resistance to peeling off. The patent underscores Banine's ingenuity in optimizing the novel lithographic processes.

2. Component for use in a patterning device environment: This patent showcases Banine's expertise in suppressing EUV plasma-induced contaminant release and reducing defectivity caused by atomic hydrogen or other radicals. By treating the component, Banine ensures optimal performance in a patterning device environment.

3. A conduit array comprising at least one conduit treated to promote adhesion of a contaminant: Banine's innovation lies in treating the conduit to enhance the adhesion of a contaminant. This invention highlights his commitment to developing efficient solutions and maintaining the integrity of conduit functionalities.

Career Highlights:

During his illustrious career, Vadim Yevgenyevich Banine has held positions in industry-leading companies such as ASML Netherlands B.V. and Carl Zeiss SMT GmbH. His contributions have shaped the landscape of lithographic technology, demonstrating his prowess and commitment to advancing the field.

Collaborations:

Banine has had the privilege of collaborating with esteemed professionals in the field. Notably, Banine has worked alongside Johannes Hubertus Josephina Moors and Erik Roelof Loopstra, both highly regarded for their contributions to lithography. These collaborations showcase Banine's ability to thrive in teamwork environments while pushing boundaries with cutting-edge innovations.

Conclusion:

Vadim Yevgenyevich Banine's extensive patent portfolio, including his latest inventions in lithography, exemplifies his distinguished career as an inventive force. With an impressive 191 patents to his name, Banine has left an indelible mark on the field of lithography. His expertise in improving resistance to peeling off, suppressing contamination, and promoting adhesion showcases his dedication to pushing the boundaries of technology. As the industry continues to evolve, Banine's contributions firmly establish him as a pioneering mind in the world of lithography.

Profile summary based on public USPTO records.