The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2021
Filed:
Feb. 15, 2018
Asml Netherlands B.v., Veldhoven, NL;
Joost André Klugkist, Waalre, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Johan Franciscus Maria Beckers, Veldhoven, NL;
Madhusudhanan Jambunathan, Eindhoven, NL;
Maxim Aleksandrovich Nasalevich, Eindhoven, NL;
Andrey Nikipelov, Eindhoven, NL;
Roland Johannes Wilhelmus Stas, 's-Hertogenbosch, NL;
David Ferdinand Vles, Eindhoven, NL;
Wilhelmus Jacobus Johannes Welters, Weert, NL;
Sandro Wricke, Nuenen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.