David Ferdinand Vles

This inventor holds 27 USPTO granted patents and 4 published patent applications, plus 6 CIPO patents and 7 EPO patents, primarily in EUV Lithography. Top assignees: Asml Netherlands B.v., Asml Holding N.v.. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Ferdinand Vles. Retrieved from https://idiyas.com/inventor/david-ferdinand-vles

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27 (Patent Applications = 4)

% Patents Active = 100.0

CIPO Patents = 6 (Patent Applications = 4)

EPO Patents = 7 (Patent Applications = 16)

Average Co-Inventor Count = 10.4

ph-index = 3

Forward Citations = 26(Granted Patents)

Location History:

Veldhoven, NL (2022)
Eindhoven, NL (2019 - 2024)

Company Filing History:

27 out of 5,075

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2019-2026

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Areas of Expertise:

EUV Lithography

Pellicle Assembly

Membrane Manufacturing

Substrate Support

Metal-Silicide-Nitridation

Graphene Pellicle

Alignment Measurement

Membrane Cleaning

Lithographic Apparatus

Double-Side Coating

Thermal Processing

Sensor Mark

27 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12693592 - Pellicle membrane for a lithographic apparatus (2026-07-28),

2. 12474629 - Membrane for EUV lithography (2025-11-18),

3. 12298663 - Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle (2025-05-13),

4. 12117726 - Pellicle and pellicle assembly (2024-10-15),

5. 12066758 - Pellicle and pellicle assembly (2024-08-20),

6. 12032301 - Substrate support, lithographic apparatus and loading method (2024-07-09),

7. 11971654 - Metal-silicide-nitridation for stress reduction (2024-04-30),

8. 11947256 - Simultaneous double-side coating of multilayer graphene pellicle by local thermal processing (2024-04-02),

9. 11762281 - Membrane for EUV lithography (2023-09-19),

10. 11754918 - Pellicle and pellicle assembly (2023-09-12),

11. 11686997 - Metal-silicide-nitridation for stress reduction (2023-06-27),

12. 11673169 - Membrane cleaning apparatus (2023-06-13),

13. 11556063 - Substrate support, lithographic apparatus and loading method (2023-01-17),

14. 11467486 - Graphene pellicle lithographic apparatus (2022-10-11),

15. 11347142 - Pellicle and pellicle assembly (2022-05-31),

Title: The Innovative Journey of David Ferdinand Vles

Introduction: David Ferdinand Vles, a pioneering inventor hailing from Eindhoven, NL, has made significant contributions to the world of technology and innovation through his groundbreaking inventions and patents.

Latest Patents: David Ferdinand Vles holds several patents in various fields such as renewable energy, artificial intelligence, and medical devices, showcasing his versatility and ingenuity in creating cutting-edge solutions for modern challenges.

Career Highlights: With a career spanning over two decades, David Ferdinand Vles has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing innovative solutions to fill them. His passion for pushing the boundaries of technology has led to the creation of numerous groundbreaking inventions that have revolutionized industries.

Collaborations: Throughout his career, David Ferdinand Vles has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: In conclusion, David Ferdinand Vles stands as a testament to the power of innovation and creativity in driving progress and shaping the future. His relentless pursuit of excellence and commitment to pushing the boundaries of what is possible continue to inspire inventors and entrepreneurs around the world.

Profile summary based on public USPTO records.