The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Oct. 11, 2016
Asml Netherlands B.v., Veldhoven, NL;
Mária Péter, Eindhoven, NL;
Erik Achilles Abegg, Eindhoven, NL;
Adrianus Johannes Maria Giesbers, Vlijmen, NL;
Johan Hendrik Klootwijk, Eindhoven, NL;
Maxim Aleksandrovich Nasalevich, Eindhoven, NL;
Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Deurne, NL;
Willem Joan Van Der Zande, Bussum, NL;
Pieter-Jan Van Zwol, Eindhoven, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Leende, NL;
David Ferdinand Vles, Eindhoven, NL;
Willem-Pieter Voorthuijzen, 's-Hertogenbosch, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.