Adrianus Johannes Maria Giesbers

USPTO Granted Patents = 12 (Patent Applications = 6)

CIPO Patents = 2 (Patent Applications = 4)

EPO Patents = 3 (Patent Applications = 13)

Average Co-Inventor Count = 10.5

ph-index = 2

Forward Citations = 6(Granted Patents)

Location History:

Eindhoven, NL (2021)
Veldhoven, NL (2022)
Vlijmen, NL (2022 - 2024)

Company Filing History:

11 out of 4,899

Asml Netherlands B.v.

Years Active: 2021-2025

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12436454 - Pellicle membrane (2025-10-07),

2. 12298663 - Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle (2025-05-13),

3. 12117726 - Pellicle and pellicle assembly (2024-10-15),

4. 12072620 - Method of manufacturing a membrane assembly (2024-08-27),

5. 11971654 - Metal-silicide-nitridation for stress reduction (2024-04-30),

6. 11947256 - Simultaneous double-side coating of multilayer graphene pellicle by local thermal processing (2024-04-02),

7. 11754918 - Pellicle and pellicle assembly (2023-09-12),

8. 11686997 - Metal-silicide-nitridation for stress reduction (2023-06-27),

9. 11467486 - Graphene pellicle lithographic apparatus (2022-10-11),

10. 11287737 - Metal-silicide-nitridation for stress reduction (2022-03-29),

11. 11231646 - Pellicle and pellicle assembly (2022-01-25),

12. 11090860 - 3D printing of graphene (oxide) composites (2021-08-17),

Certainly! Here is the article about inventor Adrianus Johannes Maria Giesbers:

Title: Unveiling the Innovation Journey of Adrianus Johannes Maria Giesbers

Introduction:

Adrianus Johannes Maria Giesbers, a distinguished innovator hailing from Vlijmen, NL, has made significant contributions to the realm of lithographic apparatus technology. With an impressive portfolio of 8 patents to his name, Giesbers stands as a beacon of ingenuity in the field of materials science and semiconductor manufacturing.

Latest Patents:

Giesbers' latest patents showcase his expertise in addressing critical challenges in lithographic processes. Noteworthy inventions include the development of metal-silicide-nitridation for stress reduction in pellicles for lithographic apparatus, as well as the revolutionary concept of simultaneous double-side coating of multilayer graphene pellicles through local thermal processing. These innovations have paved the way for enhanced performance and reliability in lithography applications.

Career Highlights:

Having collaborated with leading industry players such as ASML Netherlands B.V. and Signify Holding B.V., Giesbers has garnered invaluable experience in translating cutting-edge research into practical solutions. His keen focus on optimizing pellicle design and functionality has earned him accolades within the semiconductor community.

Collaborations:

Throughout his career, Giesbers has had the privilege of working alongside talented individuals such as Pieter-Jan Van Zwol and Evgenia Kurganova. These collaborative efforts have not only fostered knowledge exchange but have also spurred the development of groundbreaking technologies that redefine industry standards.

Conclusion:

In conclusion, Adrianus Johannes Maria Giesbers' relentless pursuit of innovation and unwavering dedication to advancing lithographic technology have solidified his standing as a visionary inventor. His remarkable contributions continue to inspire and shape the landscape of semiconductor manufacturing, propelling the industry towards a future defined by excellence and progress.

This text is generated by artificial intelligence and may not be accurate.