The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Jul. 24, 2020
Asml Netherlands B.v., Veldhoven, NL;
Paul Janssen, Eindhoven, NL;
Maxime Biron, Bromont, CA;
Inci Donmez Noyan, Eindhoven, NL;
Lourdes Ferre Llin, Geldrop, NL;
Adrianus Johannes Maria Giesbers, Vlijmen, NL;
Johan Hendrik Klootwijk, Eindhoven, NL;
Jan Hendrik Willem Kuntzel, Eindhoven, NL;
Arnoud Willem Notenboom, Rosmalen, NL;
Anne-Sophie Rollier, Bromont, CA;
Ties Wouter Van Der Woord, Eindhoven, NL;
Pieter-Jan Van Zwol, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method of manufacturing a pellicle membrane, the method including: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly having a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus including such a pellicle.