Inci Donmez Noyan

Title: Inci Donmez Noyan: Innovator in Pellicle Membrane Technology

Introduction

Inci Donmez Noyan is a prominent inventor based in Eindhoven, Netherlands. She has made significant contributions to the field of materials science, particularly in the development of pellicle membranes. Her innovative work has led to the filing of a patent that showcases her expertise and creativity in this specialized area.

Latest Patents

Inci Donmez Noyan holds a patent for a method of manufacturing a pellicle membrane. This method involves providing a first sacrificial layer on a planar substrate to form a stack. Additionally, it includes the application of at least one metal silicide or doped metal silicide pellicle core layer, which forms part of the pellicle membrane. The patent also describes a pellicle membrane assembly that consists of a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer, which is integral to the pellicle core. Furthermore, it outlines a lithography apparatus that incorporates such a pellicle.

Career Highlights

Inci Donmez Noyan is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. Her role at ASML allows her to work on cutting-edge technologies that are essential for the advancement of lithography processes. With her innovative mindset, she continues to push the boundaries of what is possible in her field.

Collaborations

Throughout her career, Inci has collaborated with notable colleagues, including Paul Janssen and Maxime Biron. These collaborations have fostered an environment of innovation and have contributed to the success of her projects.

Conclusion

Inci Donmez Noyan is a trailblazer in the field of pellicle membrane technology. Her patent and work at ASML Netherlands B.V. highlight her significant contributions to the industry. As she continues to innovate, her impact on materials science and lithography will undoubtedly be felt for years to come.