Lourdes Ferre Llin

Title: Lourdes Ferre Llin: Innovator in Pellicle Membrane Technology

Introduction

Lourdes Ferre Llin is a notable inventor based in Geldrop, Netherlands. She has made significant contributions to the field of lithography through her innovative work on pellicle membranes. Her expertise and dedication to advancing technology have earned her recognition in the industry.

Latest Patents

Lourdes holds a patent for a method of manufacturing a pellicle membrane. This method involves providing a first sacrificial layer on a planar substrate to form a stack. Additionally, it includes the application of at least one metal silicide or doped metal silicide pellicle core layer, which forms part of the pellicle membrane. The patent also describes a pellicle membrane assembly that consists of a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer, which is integral to the pellicle core. Furthermore, it outlines a lithography apparatus that incorporates such a pellicle.

Career Highlights

Lourdes is currently employed at ASML Netherlands B.V., a leading company in the development of advanced lithography systems. Her role at ASML allows her to contribute to cutting-edge technology that is essential for semiconductor manufacturing.

Collaborations

Throughout her career, Lourdes has collaborated with esteemed colleagues such as Paul Janssen and Maxime Biron. These collaborations have further enhanced her work and contributed to the success of her projects.

Conclusion

Lourdes Ferre Llin is a pioneering inventor whose work on pellicle membranes has made a significant impact in the field of lithography. Her innovative methods and dedication to technology continue to influence the industry.