The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2022
Filed:
Nov. 05, 2018
Asml Netherlands B.v., Veldhoven, NL;
Pieter-Jan Van Zwol, Veldhoven, NL;
Adrianus Johannes Maria Giesbers, Veldhoven, NL;
Johan Hendrik Klootwijk, Veldhoven, NL;
Evgenia Kurganova, Veldhoven, NL;
Maxim Aleksandrovich Nasalevich, Veldhoven, NL;
Arnoud Willem Notenboom, Veldhoven, NL;
Mária Péter, Veldhoven, NL;
Leonid Aizikovitsj Sjmaenok, Veldhoven, NL;
Ties Wouter Van Der Woord, Veldhoven, NL;
David Ferdinand Vles, Veldhoven, NL;
Abstract
A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.