Eindhoven, Netherlands

Maxim Aleksandrovich Nasalevich

USPTO Granted Patents = 21 

 

 

Average Co-Inventor Count = 12.0

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Veldhoven, NL (2022)
  • Eindhoven, NL (2019 - 2024)

Company Filing History:


Years Active: 2019-2025

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21 patents (USPTO):Explore Patents

Title: Maxim Aleksandrovich Nasalevich: Pioneering Innovation in Lithography Technology

Introduction:

Maxim Aleksandrovich Nasalevich, a visionary inventor based in Eindhoven, NL, has been setting new standards in the field of lithography technology. With a remarkable portfolio of 17 patents, Nasalevich is at the forefront of innovation, shaping the future of technology with his groundbreaking inventions.

Latest Patents:

Nasalevich's latest patents showcase his ingenuity and expertise in the field. One of his remarkable inventions is the "Pellicle for EUV lithography," a wafer design that includes a mask on one face and at least one layer on the opposite face. This innovative method involves defining a scribeline in the mask and selectively removing a portion of the layer to prepare the pellicle. Additionally, Nasalevich's "Metal-silicide-nitridation for stress reduction" patent introduces a pellicle for a lithographic apparatus incorporating nitridated metal silicide or nitridated silicon, revolutionizing stress reduction techniques in lithography.

Career Highlights:

Nasalevich has made significant contributions to companies such as ASML Netherlands B.V. and ASML Holding N.V., where his expertise and innovative spirit have been instrumental in driving technological advancements. His dedication to excellence and relentless pursuit of innovation have earned him a reputation as a pioneer in the field of lithography technology.

Collaborations:

Throughout his career, Nasalevich has collaborated with esteemed professionals in the industry, including coworkers like David Ferdinand Vles and Pieter-Jan Van Zwol. These collaborations have led to the development of groundbreaking technologies and have further solidified Nasalevich's position as a leading innovator in his field.

Conclusion:

Maxim Aleksandrovich Nasalevich's passion for innovation and relentless pursuit of excellence continue to inspire the next generation of inventors. His groundbreaking patents in lithography technology have not only shaped the future of technology but have also established him as a trailblazer in the field. Nasalevich's dedication to pushing the boundaries of what is possible serves as a testament to the impact that one individual can have on the world of innovation.

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