The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2022
Filed:
Jun. 07, 2018
Asml Netherlands B.v., Veldhoven, NL;
Adrianus Hendrik Koevoets, Mierlo, NL;
Cornelis Adrianus De Meijere, Eindhoven, NL;
Willem Michiel De Rapper, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Jan Groenewold, Castricum, NL;
Alain Louis Claude Leroux, Eindhoven, NL;
Maxim Aleksandrovich Nasalevich, Eindhoven, NL;
Andrey Nikipelov, Eindhoven, NL;
Johannes Adrianus Cornelis Maria Pijnenburg, Moergestel, NL;
Jacobus Cornelis Gerardus Van Der Sanden, Geldrop, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.