Eindhoven, Netherlands

Willem Michiel De Rapper

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Willem Michiel De Rapper. Retrieved from https://idiyas.com/inventor/willem-michiel-de-rapper

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Innovation Spotlight: Willem Michiel De Rapper

Introduction: Willem Michiel De Rapper, a talented inventor based in Eindhoven, NL, has made significant contributions in the field of lithographic apparatus with his groundbreaking patent.

Latest Patents: Willem Michiel De Rapper holds a notable patent for a "Cooling apparatus and plasma-cleaning station for cooling apparatus." This invention features a lithographic apparatus with a unique cooling system that removes heat from the substrate during use, enhancing operational efficiency.

Career Highlights: De Rapper is associated with the reputable company ASML Netherlands B.V., a key player in the technology industry known for its cutting-edge innovations in semiconductor manufacturing. His expertise and inventive spirit have played a crucial role in shaping the future of lithography.

Collaborations: Throughout his career, Willem Michiel De Rapper has collaborated with skilled professionals such as Adrianus Hendrik Koevoets and Cornelis Adrianus De Meijere. These collaborations have led to the development of pioneering technologies and solutions in the realm of lithographic apparatus.

Conclusion: Willem Michiel De Rapper's inventive prowess and dedication to advancing technology have cemented his reputation as a leading figure in the field of lithography. His patent stands as a testament to his innovative mindset and commitment to driving progress in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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