Sjoerd Nicolaas Lambertus Donders

's-Hertogenbosch, Netherlands

Sjoerd Nicolaas Lambertus Donders

Average Co-Inventor Count = 7.1

ph-index = 20

Forward Citations = 2,343(Granted Patents)

Forward Citations (Not Self Cited) = 1,620(Sep 21, 2024)

DiyaCoin DiyaCoin 1.67 

Inventors with similar research interests:


Location History:

  • Hertogenbosch, NL (2009 - 2012)
  • HN s-Hertogenbosch, NL (2011 - 2014)
  • ′S-Hertogenbosch, NL (2006 - 2018)
  • Veldhoven, NL (2019)
  • 's-Hergotenbosch, NL (2018 - 2021)
  • 's-Hertogenbosch, NL (2004 - 2022)
  • Vught, NL (2009 - 2024)


Years Active: 2004-2025

where 'Filed Patents' based on already Granted Patents

230 patents (USPTO):

Title: Sjoerd Nicolaas Lambertus Donders: Pioneer of Lithographic Apparatus Innovations

Introduction:

In the world of innovations and patents, few inventors boldly make their mark with numerous groundbreaking inventions. One such exceptional talent is Sjoerd Nicolaas Lambertus Donders, hailing from 's-Hertogenbosch, Netherlands. With an impressive portfolio of 224 patents, Donders has left an indelible impact on the field of lithographic apparatus. This article delves into his latest patents, career highlights, collaborations, and notable contributions to the industry.

Latest Patents:

Donders' recent patents showcase his expertise in developing substrate holders and cutting-edge lithographic apparatus. These patents reflect his innovative approach towards improving manufacturing techniques and components used in lithography systems. One striking example is the patent titled "Substrate Holder and Method of Manufacturing a Substrate Holder," which involves a substrate holder designed for lithographic apparatus. This holder includes a main body with CrN-coated first burls on one side and second burls on the other, ensuring optimal substrate support.

Another remarkable patent is the "Substrate Holder, Lithographic Apparatus, Device Manufacturing Method, and Method of Manufacturing a Substrate Holder." This invention introduces a main body with a thin-film stack, incorporating various electronic or electric components, such as electrodes, sensors, heaters, transistors, or logic devices. The thin-film stack is complemented by a top isolation layer, with burls for substrate support either directly on the stack or within its apertures.

Career Highlights:

Donders has contributed significantly to the innovation ecosystem through his association with prominent companies, including ASML Netherlands B.V. and ASML Holding N.V. These collaborations served as launching pads for his inventive ideas, allowing him to refine and perfect his concepts within a supportive and cutting-edge environment. His relentless pursuit of excellence has laid the foundation for numerous advancements in lithographic apparatus technology.

Collaborations:

Among Donders' trusted colleagues, two notable individuals stand out: Christiaan Alexander Hoogendam and Bob Streefkerk. Together, they have collaborated on various projects, pooling their unique skills and expertise to create remarkable inventions. Hoogendam and Streefkerk have been instrumental in propelling Donders' ideas from the concept stage to practical implementation, further solidifying his position as a prominent inventor.

Conclusion:

Sjoerd Nicolaas Lambertus Donders has left an indelible mark on the world of lithographic apparatus inventions. With a staggering portfolio of 224 patents, his work in developing substrate holders and advancing lithographic apparatus technology is commendable. Through collaborations with accomplished colleagues and his affiliations with industry giants like ASML, Donders continues to push the boundaries of innovation. As the industry evolves, we eagerly anticipate Donders' future contributions and advancements that will shape the future of the lithography field.

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