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Veldhoven, Netherlands

Asml Holdings N.v.

USPTO Granted Patents = 23

% Expired Patents = 26.1

Forward Citations = 159

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60 inventors (with patents filed for the assignee):

Hilario L Oh (3 out of 16 patents)

Andrew Nguyen (2 out of 183 patents)

Herman Vogel (2 out of 32 patents)

4. Ronald A Wilklow (2 out of 14 patents)

5. Emir Gurer (2 out of 20 patents)

6. Matthew E Hansen (2 out of 11 patents)

7. Stephen Roux (1 out of 45 patents)

8. Joost Jeroen Ottens (1 out of 124 patents)

9. Nicolaas Ten Kate (1 out of 141 patents)

10. Jeroen Johannes Sophia Maria Mertens (1 out of 151 patents)

11. Martinus Cornelis Maria Verhagen (1 out of 47 patents)

12. Krishanu Shome (1 out of 16 patents)

13. Martinus Hendrikus Antonius Leenders (1 out of 127 patents)

14. Sjoerd Nicolaas Lambertus Donders (1 out of 233 patents)

15. David Taub (1 out of 7 patents)

23 patents: Sort by Forward Citations

1. 11493852 - Noise correction for alignment signal (2022-11-08),

2. 11204559 - High stability collimator assembly, lithographic apparatus, and method (2021-12-21),

3. 9904185 - Lithographic apparatus and device manufacturing method (2018-02-27),

4. 8902562 - Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp (2014-12-02),

5. 8730450 - Immersion photolithography system and method using microchannel nozzles (2014-05-20),

6. 8553207 - Optically compensated unidirectional reticle bender (2013-10-08),

7. 8553205 - Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus (2013-10-08),

8. 8339571 - Lithographic method and apparatus (2012-12-25),

9. 8221641 - Method of dispensing a semiconductor processing fluid (2012-07-17),

10. 7602503 - Methods for measuring a wavefront of an optical system (2009-10-13),

11. 7531040 - Resist recovery method (2009-05-12),

12. 7272976 - Pressure sensor (2007-09-25),

13. 7242464 - Method for characterizing optical systems using holographic reticles (2007-07-10),

14. 7242456 - System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions (2007-07-10),

15. 7208262 - Yield and line width performance for liquid polymers and other materials (2007-04-24),

Company Overview

ASML Holdings N.V. is a leading supplier of photolithography equipment used in the semiconductor manufacturing industry. The company specializes in advanced technology that enables the production of integrated circuits, which are essential for a wide range of electronic devices. With a strong focus on innovation, ASML plays a crucial role in the development of extreme ultraviolet (EUV) lithography systems, pushing the boundaries of chip design and fabrication. Headquartered in Veldhoven, Netherlands, ASML serves a global customer base, contributing significantly to the advancement of semiconductor technology.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

23 Patents

#7 in Veldhoven

#311 in Netherlands

#27,714 in the World

Veldhoven, Netherlands

Asml Holdings N.v.

Forward Citations = 159

60 inventors:

Hilario L Oh (3 out of 16 patents)

Andrew Nguyen (2 out of 183 patents)

Herman Vogel (2 out of 32 patents)

4. Ronald A Wilklow (2 out of 14 patents)

5. Emir Gurer (2 out of 20 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Asml Holdings N.v.. Retrieved from https://idiyas.com/company/asml-holdings-n-v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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