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Veldhoven, Netherlands

Asml Holdings N.v.

USPTO Granted Patents = 23

Forward Citations = 154

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60 inventors (with patents filed for the assignee):

Hilario L Oh (3 out of 16 patents)

Andrew Nguyen (2 out of 179 patents)

Herman Vogel (2 out of 32 patents)

4. Ronald A Wilklow (2 out of 14 patents)

5. Emir Gurer (2 out of 20 patents)

6. Matthew E Hansen (2 out of 11 patents)

7. Stephen Roux (1 out of 40 patents)

8. Joost Jeroen Ottens (1 out of 124 patents)

9. Nicolaas Ten Kate (1 out of 141 patents)

10. Jeroen Johannes Sophia Maria Mertens (1 out of 151 patents)

11. Martinus Cornelis Maria Verhagen (1 out of 47 patents)

12. Krishanu Shome (1 out of 15 patents)

13. Martinus Hendrikus Antonius Leenders (1 out of 126 patents)

14. Sjoerd Nicolaas Lambertus Donders (1 out of 231 patents)

15. David Taub (1 out of 7 patents)

23 patents: Sort by Forward Citations

1. 11493852 - Noise correction for alignment signal (2022-11-08),

2. 11204559 - High stability collimator assembly, lithographic apparatus, and method (2021-12-21),

3. 9904185 - Lithographic apparatus and device manufacturing method (2018-02-27),

4. 8902562 - Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp (2014-12-02),

5. 8730450 - Immersion photolithography system and method using microchannel nozzles (2014-05-20),

6. 8553207 - Optically compensated unidirectional reticle bender (2013-10-08),

7. 8553205 - Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus (2013-10-08),

8. 8339571 - Lithographic method and apparatus (2012-12-25),

9. 8221641 - Method of dispensing a semiconductor processing fluid (2012-07-17),

10. 7602503 - Methods for measuring a wavefront of an optical system (2009-10-13),

11. 7531040 - Resist recovery method (2009-05-12),

12. 7272976 - Pressure sensor (2007-09-25),

13. 7242464 - Method for characterizing optical systems using holographic reticles (2007-07-10),

14. 7242456 - System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions (2007-07-10),

15. 7208262 - Yield and line width performance for liquid polymers and other materials (2007-04-24),

ASML Holdings N.V. is a Dutch company and currently the largest supplier in the world of photolithography equipment used for semiconductor manufacturing. The company manufactures machines for the production of integrated circuits (ICs), such as CPUs, memory chips, and more. ASML's products are used by most major semiconductor manufacturers in the world to produce advanced chips for a wide range of electronic devices. The company is headquartered in Veldhoven, Netherlands.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

23 Patents

#7 in Veldhoven

#305 in Netherlands

#26,825 in the World

Veldhoven, Netherlands

Asml Holdings N.v.

Forward Citations = 154

60 inventors:

Hilario L Oh (3 out of 16 patents)

Andrew Nguyen (2 out of 179 patents)

Herman Vogel (2 out of 32 patents)

4. Ronald A Wilklow (2 out of 14 patents)

5. Emir Gurer (2 out of 20 patents)

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