Joost Jeroen Ottens

Title: Joost Jeroen Ottens - Innovator in Lithographic Apparatus Development

Introduction:

Joost Jeroen Ottens is a renowned inventor and innovator in the field of lithographic apparatus and device manufacturing. Hailing from Veldhoven, Netherlands, Ottens has made significant contributions to the development of lithographic technology, with an extensive patent portfolio and a successful career in leading companies in the industry.

Latest Patents:

Ottens' recent patents showcase his expertise in lithographic apparatus and device manufacturing methods. Some of his notable patents include:

1. Lithographic apparatus with a temperature-controlling cover plate: Ottens has designed a lithographic apparatus that utilizes a cover plate separate from the substrate table. This invention allows for better control of the substrate table's temperature by regulating the temperature of the cover plate.

2. Lithographic apparatus with thermal insulation: Ottens has developed a lithographic apparatus with thermal insulation between the cover plate and the substrate table. This design ensures that the cover plate acts as a thermal shield for the substrate table, thereby improving the overall performance of the apparatus.

3. Distortion detection and position control improvement: Ottens' innovation involves the inclusion of means to determine substrate table distortion and enhance position control of the substrate by referencing the identified distortion. This advancement leads to more accurate positioning and greater precision in lithographic processes.

Career Highlights:

Throughout his career, Ottens has worked with reputable companies in the industry, making significant contributions to their technological advancements. He has collaborated with the following organizations:

1. ASML Netherlands B.V. (ASML): Ottens has contributed extensively to ASML, a leading manufacturer of lithography systems for the semiconductor industry. His expertise in lithographic apparatus development has aided ASML in maintaining its position as a pioneer in the field.

2. ASML Holding N.V.: As a part of ASML Holding N.V., Ottens has played a crucial role in the overall design and enhancement of their lithographic apparatus products. His patents and inventions have undoubtedly contributed to the company's success and technological achievements.

Collaborations:

Ottens has collaborated with esteemed colleagues throughout his career. Notable individuals he has worked closely with include:

1. Koen Jacobus Johannes Maria Zaal: Ottens has had a productive working relationship with Zaal, who shares his passion for lithographic innovation. The collaboration of these two individuals has likely resulted in groundbreaking advancements in lithographic apparatus development.

2. Martinus Hendrikus Antonius Leenders: Ottens and Leenders have collaborated on numerous projects, leveraging their combined expertise in lithographic apparatus and device manufacturing. Their joint efforts have undoubtedly played a significant role in shaping the industry.

Conclusion:

Joost Jeroen Ottens has made substantial contributions to the field of lithographic apparatus and device manufacturing. With an impressive patent portfolio and successful collaborations with renowned companies and colleagues, Ottens has cemented his position as an innovator in the industry. His dedication to pushing the boundaries of lithographic technology continues to drive advancements in the field, benefitting manufacturers, researchers, and the semiconductor industry as a whole.