The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2024
Filed:
Dec. 22, 2022
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Nicolaas Rudolf Kemper, Eindhoven, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Edwin Cornelis Kadijk, Eindhoven, NL;
Sergei Shulepov, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03B 27/42 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03B 27/42 (2013.01); G03F 7/70341 (2013.01); G03F 7/70716 (2013.01);
Abstract
Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.