= 10.95 Inventors with similar research interests:
Location History:
- Ba Heeze, NL (2006 - 2009)
- Fleeze, NL (2011)
- Eindhoven, DE (2016)
- Veldhoven, NL (2017 - 2020)
- Eindhoven, NL (2005 - 2021)
- Huernheim, DE (2020 - 2021)
- Heeze, NL (1998 - 2022)
Years Active: 1998-2022
Title: Erik Roelof Loopstra: Innovating the World of Lithography
Introduction:
Erik Roelof Loopstra is a prominent inventor hailing from Heeze, the Netherlands, who has made significant contributions to the field of lithography. With an impressive track record of 330 patents to his name, Loopstra has been an instrumental force in advancing technology within this domain. This article delves into his latest patents, career highlights, and notable collaborations, highlighting his profound impact on the industry.
Latest Patents:
Among Loopstra's recent patents, two notable inventions have garnered attention in the field of lithography:
1. Lithographic Apparatus and Device Manufacturing Method Involving a Heater:
This patent presents a novel lithographic apparatus that utilizes a liquid supply system to fill the space between the projection system and the substrate with liquid. The apparatus includes a barrier member to contain the liquid within the designated space, along with a heater.
2. Projection System and Mirror and Radiation Source for a Lithographic Apparatus:
This patent outlines a system designed to project radiation onto a specific section of a substrate within a lithographic apparatus. The invention incorporates a grating structure within the radiation source, which enables the suppression of the zeroth order of reflected radiation for a specific component wavelength.
Career Highlights:
Loopstra's career has been closely associated with two renowned companies in the field of lithography:
1. ASML Netherlands B.V.:
As a key contributor to ASML, a world-leading supplier of lithography systems for the semiconductor industry, Loopstra has played a role in driving technological advancements in high-performance lithography systems. His extensive patent portfolio showcases his innovation and commitment to the company's success.
2. Carl Zeiss SMT GmbH:
Another significant chapter in Loopstra's career has been his association with Carl Zeiss SMT GmbH, a globally recognized company specializing in optics and optoelectronics. His contributions to Carl Zeiss SMT GmbH have been instrumental in advancing lithography technology, further cementing his reputation in the industry.
Collaborations:
Throughout his journey, Loopstra has collaborated with notable professionals, enhancing his innovative endeavors. Noteworthy collaborators include:
1. Johannes Catharinus Hubertus Mulkens:
Mulkens, a respected figure in lithography research, has collaborated closely with Loopstra on various projects. Their combined expertise has resulted in the development of groundbreaking technologies within the field.
2. Bob Streefkerk:
Loopstra's partnership with Bob Streefkerk has yielded fruitful outcomes, contributing to the advancement of lithography technology. Streefkerk's expertise complemented Loopstra's inventiveness, resulting in successful collaborative projects.
Conclusion:
Erik Roelof Loopstra's contributions to the world of lithography are exemplary, evidenced by his extensive patent portfolio and the significant impact he has made in the industry. With groundbreaking inventions and notable collaborations, Loopstra continues to push the boundaries of technology, solidifying his position as a key innovator in the field of lithography. His work plays a pivotal role in shaping the future of this vital industry.
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