The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2020
Filed:
Jan. 25, 2019
Asml Netherlands B.v., Veldhoven, NL;
Marcus Adrianus Van De Kerkhof, Veldhoven, NL;
Anton Bernhard Van Oosten, Veldhoven, NL;
Hans Butler, Best, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Koen Jacobus Johannes Maria Zaal, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.