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Veldhoven, Netherlands

Asm Lithography B.v.

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USPTO Granted Patents = 29

Forward Citations = 2,519

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54 inventors (with patents filed for the assignee):

Erik Roelof Loopstra (6 out of 335 patents)

Marinus Aart Van Den Brink (5 out of 26 patents)

Alexander Straaijer (3 out of 83 patents)

4. Harmen Klaas Van Der Schoot (3 out of 43 patents)

5. Gerrit Maarten Bonnema (3 out of 3 patents)

6. Johannes C Mulkens (3 out of 6 patents)

7. Jan Van Eijk (2 out of 36 patents)

8. Gerjan P Veldhuis (2 out of 5 patents)

9. Bruce W Smith (2 out of 25 patents)

10. Adrianus Gerardus Bouwer (2 out of 16 patents)

11. Judocus M Stoeldrayer (2 out of 2 patents)

12. Johannes Cm Jasper (2 out of 2 patents)

13. Christianus Gerardus Maria De Mol (1 out of 18 patents)

14. Hans Butler (1 out of 157 patents)

15. Hans Van Der Laan (1 out of 43 patents)

Core Competencies:

Optical Imaging

Lithographic Projection

Illumination Device

Positioning Device

Phase Boundary Masking

Gas Bearing

Alignment System

Photolithographic Apparatus

Scanning-Slit Exposure

Interferometer System

Substrate Holder

Mask Pattern Projection

29 patents: Sort by Forward Citations

1. 6563564 - Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby (2003-05-13),

2. 6466304 - Illumination device for projection system and method for fabricating (2002-10-15),

3. 6388736 - Imaging method using phase boundary masking with modified illumination (2002-05-14),

4. 6384899 - Lithographic projection apparatus (2002-05-07),

5. 6373552 - Optical correction plate, and its application in a lithographic projection apparatus (2002-04-16),

6. 6373072 - Lithographic projection apparatus (2002-04-16),

7. 6362871 - Lithographic apparatus (2002-03-26),

8. 6348303 - Lithographic projection apparatus (2002-02-19),

9. 6337484 - Positioning device and lithographic projection apparatus comprising such a device (2002-01-08),

10. 6297876 - Lithographic projection apparatus with an alignment system for aligning substrate on mask (2001-10-02),

11. 6296990 - Gas bearing and lithographic apparatus including such a bearing (2001-10-02),

12. 6262796 - Positioning device having two object holders (2001-07-17),

13. 6239862 - Photolithographic apparatus (2001-05-29),

14. 6232615 - Lithographic projection apparatus with improved substrate holder (2001-05-15),

15. 6208407 - Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement (2001-03-27),

Company Overview

ASML Lithography B.V., headquartered in Veldhoven, Netherlands, is a leading supplier of photolithography equipment used in the semiconductor manufacturing process. The company specializes in advanced lithography systems that enable the production of integrated circuits, playing a crucial role in the advancement of microelectronics. ASML's innovations are pivotal in driving the miniaturization of electronic components, enhancing performance, and supporting the growth of various technology sectors, including consumer electronics, automotive, and telecommunications.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Nov 10 2026

29 Patents

#5 in Veldhoven

#256 in Netherlands

#22,622 in the World

Veldhoven, Netherlands

Asm Lithography B.v.

Forward Citations = 2,519

54 inventors:

Erik Roelof Loopstra (6 out of 335 patents)

Marinus Aart Van Den Brink (5 out of 26 patents)

Alexander Straaijer (3 out of 83 patents)

4. Harmen Klaas Van Der Schoot (3 out of 43 patents)

5. Gerrit Maarten Bonnema (3 out of 3 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Asm Lithography B.v.. Retrieved from https://idiyas.com/company/asm-lithography-b-v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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