Webster, NY, United States of America

Bruce W Smith


Average Co-Inventor Count = 1.0

ph-index = 8

Forward Citations = 314(Granted Patents)


Location History:

  • Penfield, NY (US) (2005 - 2010)
  • Webster, NY (US) (1999 - 2014)

Company Filing History:


Years Active: 1999-2014

Loading Chart...
25 patents (USPTO):Explore Patents

Title: The Innovative Mind of Bruce W Smith: A Pioneering Inventor from Webster, NY

Introduction: Bruce W Smith, a creative thinker and inventor hailing from Webster, NY, has made significant strides in the field of photolithography and aberration evaluation with an outstanding portfolio of 25 patents to his name.

Latest Patents:

1. Method of photolithography using a fluid and a system thereof: Bruce W Smith's groundbreaking invention revolutionizes photolithographic exposure systems by incorporating a fluid with specific refractive index properties. This method enhances image projection onto substrates with unparalleled precision.

2. Method for aberration evaluation in a projection system: His innovative technique for detecting and measuring aberrations in optical systems sets a new standard in the industry. By utilizing a test target with unique phase zones, Bruce enables the identification of various aberration types with exceptional accuracy.

Career Highlights:

Bruce W Smith has left an indelible mark on the innovation landscape through his work at esteemed institutions such as the Rochester Institute of Technology and ASML Netherlands B.V. His dedication to pushing the boundaries of technology and optics has earned him a revered reputation in the industry.

Collaborations:

Throughout his career, Bruce has collaborated with accomplished professionals like his coworker John S Petersen. Together, they have synergized their expertise to tackle complex challenges in the realm of optical systems, fostering a culture of innovation and excellence.

Conclusion:

In conclusion, Bruce W Smith's inventive spirit and commitment to excellence have propelled him to the forefront of technological advancement. His remarkable contributions to photolithography and aberration evaluation underscore his status as a visionary inventor shaping the future of the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…