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For the Inventor, By the Inventor

Webster, NY, United States of America

Bruce W Smith

This inventor holds 25 USPTO granted patents, primarily in Optical Lithography. Top assignees: Rochester Institute of Technology, Asml Netherlands B.v., Asm Lithography B.v.. Active years: 1999-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bruce W Smith. Retrieved from https://idiyas.com/inventor/bruce-w-smith

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25

% Patents Active = 76.0

Average Co-Inventor Count = 1.0

ph-index = 8

Forward Citations = 314(Granted Patents)


Location History:

  • Penfield, NY (US) (2005 - 2010)
  • Webster, NY (US) (1999 - 2014)

Company Filing History:

goldMedal9 out of 157 
 
Rochester Institute of Technology
 patents
silverMedal7 out of 5,076 
 
Asml Netherlands B.v.
 patents
bronzeMedal2 out of 29 
 
Asm Lithography B.v.
 patents
4. 2 out of 87 
 
Asml Masktools B.v.
 patents
5. 5 out of 834,570 
Other
 patents

Years Active: 1999-2014

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Areas of Expertise:
Photolithography
Aberration Evaluation
Illumination Device
Photomask Correction
Spatial Filtering
Optical Proximity Correction
Micropatterning
Phase Shift Mask
Imaging Method
Projection System
Sub-Resolution Features
Non-Circular Aperture
25 patents (USPTO):Explore Patents
1. 8852850 - Method of photolithography using a fluid and a system thereof (2014-10-07),
2. 7768648 - Method for aberration evaluation in a projection system (2010-08-03),
3. RE40239 - Illumination device for projection system and method for fabricating (2008-04-14),
4. 7345735 - Apparatus for aberration detection and measurement (2008-03-18),
5. 7233887 - Method of photomask correction and its optimization using localized frequency analysis (2007-06-19),
6. 7170588 - Reduction Smith-Talbot interferometer prism for micropatterning (2007-01-30),
7. 7136143 - Method for aberration detection and measurement (2006-11-14),
8. RE39349 - Masks for use in optical lithography below 180 nm (2006-10-16),
9. 7092073 - Method of illuminating a photomask using chevron illumination (2006-08-15),
10. 6934010 - Optical proximity correction method utilizing gray bars as sub-resolution assist features (2005-08-23),
11. 6881523 - Optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features (2005-04-19),
12. 6846595 - Method of improving photomask geometry (2005-01-25),
13. 6835505 - Mask for projection photolithography at or below about 160 nm and a method thereof (2004-12-28),
14. 6791667 - Illumination device for projection system and method for fabricating (2004-09-14),
15. 6788388 - Illumination device for projection system and method for fabricating (2004-09-07),

Title: The Innovative Mind of Bruce W Smith: A Pioneering Inventor from Webster, NY

Introduction: Bruce W Smith, a creative thinker and inventor hailing from Webster, NY, has made significant strides in the field of photolithography and aberration evaluation with an outstanding portfolio of 25 patents to his name.

Latest Patents:

1. Method of photolithography using a fluid and a system thereof: Bruce W Smith's groundbreaking invention revolutionizes photolithographic exposure systems by incorporating a fluid with specific refractive index properties. This method enhances image projection onto substrates with unparalleled precision.

2. Method for aberration evaluation in a projection system: His innovative technique for detecting and measuring aberrations in optical systems sets a new standard in the industry. By utilizing a test target with unique phase zones, Bruce enables the identification of various aberration types with exceptional accuracy.

Career Highlights:

Bruce W Smith has left an indelible mark on the innovation landscape through his work at esteemed institutions such as the Rochester Institute of Technology and ASML Netherlands B.V. His dedication to pushing the boundaries of technology and optics has earned him a revered reputation in the industry.

Collaborations:

Throughout his career, Bruce has collaborated with accomplished professionals like his coworker John S Petersen. Together, they have synergized their expertise to tackle complex challenges in the realm of optical systems, fostering a culture of innovation and excellence.

Conclusion:

In conclusion, Bruce W Smith's inventive spirit and commitment to excellence have propelled him to the forefront of technological advancement. His remarkable contributions to photolithography and aberration evaluation underscore his status as a visionary inventor shaping the future of the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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