The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2006
Filed:
Nov. 03, 2003
Applicant:
Bruce W. Smith, Webster, NY (US);
Inventor:
Bruce W. Smith, Webster, NY (US);
Assignee:
Rochester Institute of Technology, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01F 9/00 (2005.12);
U.S. Cl.
CPC ...
Abstract
A mask for use on a layer of imaging material which is located on at least a portion of one surface of a substrate in a lithography process in accordance with one embodiment of the present invention includes a layer of a masking material which has an optical density of at least 4.0 for wavelengths at or below about 180 nm and a thickness of less than about 1000 angstroms. Materials, such as tungsten and amorphous silicon, can be used for the mask.