The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2005
Filed:
Feb. 14, 2001
Applicant:
Bruce W. Smith, Webster, NY (US);
Inventor:
Bruce W. Smith, Webster, NY (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 900 ;
U.S. Cl.
CPC ...
Abstract
Photomask manufacture is improved by adding assist barsfor isolated features. The barsare added at a center to center spacing that corresponds to the center to center spacing for densely packed features. By matching the assist bars to the densely packed features, the combined diffraction pattern of the isolated features is modified to more closely resemble the diffraction pattern of the densely packed features.
Smith, Bruce. (2005). Method of improving photomask geometry (U.S. Patent No. 6846595). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6846595
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile