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Veldhoven, Netherlands

Asml Masktools B.v.

USPTO Granted Patents = 87

% Expired Patents = 37.9

EPO Patents = 3

Forward Citations = 1,295

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34 inventors (with patents filed for the assignee):

Jang Fung Chen (58 out of 93 patents)

Douglas Van Den Broeke (32 out of 35 patents)

Thomas Laidig (22 out of 24 patents)

4. Duan-Fu Stephen Hsu (20 out of 62 patents)

5. Kurt E Wampler (18 out of 27 patents)

6. Xuelong Shi (16 out of 20 patents)

7. Robert John Socha (13 out of 36 patents)

8. Markus Franciscus Antonius Eurlings (7 out of 38 patents)

9. Sangbong Park (7 out of 25 patents)

10. Noel Corcoran (7 out of 7 patents)

11. Stephen Hsu (7 out of 7 patents)

12. Doug Van Den Broeke (5 out of 8 patents)

13. Jung Chul Park (5 out of 5 patents)

14. Uwe Hollerbach (5 out of 5 patents)

15. Armin Liebchen (5 out of 5 patents)

Core Competencies:

Optical Proximity Correction

Pattern Decomposition

Illumination Optimization

Sub-Wavelength Lithography

Model-Based OPC

Scattering Bar Placement

Resist Development

Multiple Exposure Processes

Calibration Techniques

Feature Optimization

Deep Sub-Wavelength

Phase-Balanced Scattering

87 patents: Sort by Forward Citations

1. 8730452 - Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction orders (2014-05-20),

2. 8644589 - Method and apparatus for performing model-based OPC for pattern decomposed features (2014-02-04),

3. 8640058 - Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process (2014-01-28),

4. 8632930 - Method and apparatus for performing dark field double dipole lithography (DDL) (2014-01-21),

5. 8615126 - Method for performing pattern decomposition based on feature pitch (2013-12-24),

6. 8521481 - Method, program product and apparatus for modeling resist development of a lithography process (2013-08-27),

7. 8495529 - Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography (2013-07-23),

8. 8495526 - Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process (2013-07-23),

9. 8395757 - Optimized polarization illumination (2013-03-12),

10. 8391605 - Method and apparatus for performing model-based OPC for pattern decomposed features (2013-03-05),

11. 8132130 - Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process (2012-03-06),

12. 8122391 - Method, program product and apparatus for performing double exposure lithography (2012-02-21),

13. 8120753 - Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process (2012-02-21),

14. 8111921 - Method and apparatus for performing model-based OPC for pattern decomposed features (2012-02-07),

15. 8111901 - Apparatus and method for separating a circuit pattern into multiple circuit patterns (2012-02-07),

ASML Masktools B.V. is a subsidiary of ASML, a global leader in the manufacture and development of lithography systems for the semiconductor industry. ASML Masktools specializes in the research, design, and production of advanced photomasks, essential for the production of semiconductor chips. With cutting-edge technology and expertise, ASML Masktools plays a vital role in enabling the production of smaller, faster, and more powerful chips used in electronics and technology worldwide.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Sep 29 2026

Asml Masktools B.v.

87 Patents

#4 in Veldhoven

#100 in Netherlands

#8,760 in the World

Veldhoven, Netherlands

Asml Masktools B.v.

Forward Citations = 1,295

34 inventors:

Jang Fung Chen (58 out of 93 patents)

Douglas Van Den Broeke (32 out of 35 patents)

Thomas Laidig (22 out of 24 patents)

4. Duan-Fu Stephen Hsu (20 out of 62 patents)

5. Kurt E Wampler (18 out of 27 patents)

Please report any incorrect information to [email protected]

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