Fremont, CA, United States of America

Duan-Fu Stephen Hsu

This inventor holds 63 USPTO granted patents and 19 published patent applications and 2 EPO patents, primarily in Lithography Optimization (CPC class G03F). Top assignees: Asml Netherlands B.v., Asml Masktools B.v., Cymer, Inc.. Active years: 2004-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Duan-Fu Stephen Hsu. Retrieved from https://idiyas.com/inventor/duan-fu-stephen-hsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 63 

% Patents Active = 76.2

 

Average Co-Inventor Count = 2.7

ph-index = 9

Forward Citations = 392(Granted Patents)

Forward Citations (Not Self Cited) = 315(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Freemont, CA (US) (2005 - 2010)
  • Fremont, CA (US) (2004 - 2024)

Company Filing History:


Years Active: 2004-2026

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Areas of Expertise:
Lithography
Optimization
Patterning Device
Wavefront Tuning
Aberration Management
Source Mask
Throughput
Defect Reduction
Simulation
Image Log Slope
Multiple Patterning
Assist Features
63 patents (USPTO):Explore Patents

Certainly! Here is the article about inventor Duan-Fu Stephen Hsu:

Title: Innovator Spotlight: Duan-Fu Stephen Hsu - Pioneering Wavefront Optimization and Zeroth Order Suppression in Fremont, CA

Introduction: Duan-Fu Stephen Hsu is a brilliant inventor based in Fremont, CA, known for his groundbreaking work in wavefront optimization and zeroth order suppression technologies. With an impressive portfolio of 54 patents, Hsu continues to drive innovation in the field of optical systems and lithography.

Latest Patents:

1. Wavefront optimization for tuning scanner based on performance matching: Hsu's method revolutionizes the determination of wavefront parameters in a patterning process, enhancing performance and precision in optical systems.

2. Imaging via zeroth order suppression: Hsu's apparatuses and techniques effectively suppress the zeroth order portion of a radiation beam, particularly in extreme ultraviolet lithographic applications, improving image formation on substrates.

Career Highlights:

Throughout his illustrious career, Hsu has made significant contributions to companies like ASML Netherlands B.V. and ASML MaskTools B.V. His expertise and dedication have played a pivotal role in advancing optical technologies and pushing the boundaries of lithography systems.

Collaborations:

Hsu has had the privilege of working closely with industry stalwarts like Jang Fung Chen and Douglas Van Den Broeke. Together, they have explored new avenues in optical engineering, paving the way for cutting-edge developments in the field.

Conclusion:

Duan-Fu Stephen Hsu's relentless passion for innovation and his exceptional problem-solving skills have established him as a trailblazer in the realm of optical systems. His patents and contributions continue to shape the future of lithography and optical technologies, inspiring the next generation of inventors to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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