The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Feb. 25, 2022
Asml Netherlands B.v., Veldhoven, NL;
Jung Hoon Ser, Sunnyvale, CA (US);
Sungwoon Park, Sejong City, KR;
Xin Lei, San Jose, CA (US);
Jinwoong Jeong, Hwaseong, KR;
Rongkuo Zhao, San Jose, CA (US);
Duan-Fu Stephen Hsu, Fremont, CA (US);
Xiaoyang Li, Fremont, CA (US);
ASML NETHERLANDS, Veldhoven, NL;
Abstract
Methods for configuring a patterning process based on results of another patterning process is described. The method includes obtaining a first set of contours by simulating a first patterning process using a design layout in a first orientation. The contours satisfy a design specification associated with the design layout and correspond to a first set of process window conditions. A second patterning process is configured based on a second orientation of the design layout, the first set of process window conditions and the first set of contours. The second patterning process is associated with one or more design variables (e.g., illumination, mask pattern) that affect a second set of contours. The configuring includes adjusting one or more design variables until the second set of contours are within a desired matching threshold with the first set of contours.