For the Inventor, By the Inventor

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Veldhoven, Netherlands

Asml Netherlands

USPTO Granted Patents = 3

Forward Citations = 0

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14 inventors (with patents filed for the assignee):

Duan-Fu Stephen Hsu (1 out of 63 patents)

Quan Zhang (1 out of 10 patents)

Simon Hendrik Celine Van Gorp (1 out of 12 patents)

4. Xiaoyang Li (1 out of 3 patents)

5. Jun Tao (1 out of 6 patents)

6. Yongsheng Shu (1 out of 1 patent)

7. Wei-chun Fong (1 out of 1 patent)

8. Stephan Van Reenen (1 out of 1 patent)

9. Jung Hoon Ser (1 out of 1 patent)

10. Xin Lei (1 out of 1 patent)

11. Rongkuo Zhao (1 out of 1 patent)

12. Yu Cao (1 out of 5 patents)

13. Sungwoon Park (1 out of 1 patent)

14. Jinwoong Jeong (1 out of 1 patent)

3 patents: Sort by Forward Citations

1. 12755081 - Configuration of patterning process (2026-10-06),

2. 12743034 - Method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus (2026-09-22),

3. 12566368 - Method for determining a mask pattern comprising optical proximity corrections using a trained machine learning model (2026-03-03),

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USPTO Data Jan 1 1976 - Oct 6 2026

3 Patents

#17 in Veldhoven

#1,670 in Netherlands

Veldhoven, Netherlands

Asml Netherlands

Forward Citations = 0

14 inventors:

Duan-Fu Stephen Hsu (1 out of 63 patents)

Quan Zhang (1 out of 10 patents)

Simon Hendrik Celine Van Gorp (1 out of 12 patents)

4. Xiaoyang Li (1 out of 3 patents)

5. Jun Tao (1 out of 6 patents)

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