The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Feb. 20, 2019
Asml Netherlands B.v., Veldhoven, NL;
Yu Cao, Saratoga, CA (US);
Ya Luo, Saratoga, CA (US);
Yen-Wen Lu, Saratoga, CA (US);
Been-Der Chen, Milpitas, CA (US);
Rafael C. Howell, Santa Clara, CA (US);
Yi Zou, Foster City, CA (US);
Jing Su, Fremont, CA (US);
Dezheng Sun, Palo Alto, CA (US);
ASML NETHERLANDS, Veldhoven, NL;
Abstract
Methods of training machine learning models related to a patterning process, including a method for training a machine learning model configured to predict a mask pattern. The method including obtaining (i) a process model of a patterning process configured to predict a pattern on a substrate, wherein the process model comprises one or more trained machine learning models, and (ii) a target pattern, and training the machine learning model configured to predict a mask pattern based on the process model and a cost function that determines a difference between the predicted pattern and the target pattern.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile