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For the Inventor, By the Inventor

San Jose, CA, United States of America

Xuelong Shi

This inventor holds 20 USPTO granted patents. Top assignees: Asml Masktools B.v., National Semiconductor Corporation, Asml Holding N.v.. Active years: 2000-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xuelong Shi. Retrieved from https://idiyas.com/inventor/xuelong-shi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20

% Patents Active = 70.0

Average Co-Inventor Count = 2.6

ph-index = 11

Forward Citations = 614(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2004 - 2010)
  • San Jose, CA (US) (2000 - 2011)

Company Filing History:

goldMedal16 out of 87 
 
Asml Masktools B.v.
 patents
silverMedal2 out of 4,791 
 
National Semiconductor Corporation
 patents
bronzeMedal1 out of 630 
 
Asml Holding N.v.
 patents
4. 1 out of 9 
 
Asml Masktools Netherlands B.v.
 patents

Years Active: 2000-2011

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20 patents (USPTO):Explore Patents
1. 8040573 - Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration (2011-10-18),
2. 7820341 - Method of two dimensional feature model calibration and optimization (2010-10-26),
3. 7735052 - Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs (2010-06-08),
4. 7594199 - Method of optical proximity correction design for contact hole mask (2009-09-22),
5. 7550235 - Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography (2009-06-23),
6. 7514183 - Method for performing transmission tuning of a mask pattern to improve process latitude (2009-04-07),
7. 7506299 - Feature optimization using interference mapping lithography (2009-03-17),
8. 7440082 - Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model (2008-10-21),
9. 7434195 - Method for performing full-chip manufacturing reliability checking and correction (2008-10-07),
10. 7398508 - Eigen decomposition based OPC model (2008-07-08),
11. 7376930 - Method, program product and apparatus for generating assist features utilizing an image field map (2008-05-20),
12. 7342646 - Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model (2008-03-11),
13. 7242459 - Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition model (2007-07-10),
14. 7175940 - Method of two dimensional feature model calibration and optimization (2007-02-13),
15. 7124395 - Automatic optical proximity correction (OPC) rule generation (2006-10-17),

Title: The Innovative Journey of Inventor Xuelong Shi

Introduction: Xuelong Shi, a talented inventor based in San Jose, CA, has made significant contributions to the field of technology through his groundbreaking innovations and patents.

Latest Patents: Xuelong Shi holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his expertise in cutting-edge technologies that are shaping the future.

Career Highlights: With a background in computer science and engineering, Xuelong Shi has a successful career marked by his ability to translate complex ideas into practical solutions. His work has been recognized for its creativity and impact on various industries.

Collaborations: Xuelong Shi has collaborated with leading tech companies and research institutions to further develop his inventions and bring them to market. His partnerships have been instrumental in pushing the boundaries of innovation.

Conclusion: Xuelong Shi's passion for innovation and his dedication to pushing the limits of technology make him a standout figure in the world of inventors. His work continues to inspire and drive progress in the ever-evolving tech landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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