The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2009
Filed:
Jan. 14, 2004
Robert John Socha, Campbell, CA (US);
Xuelong Shi, San Jose, CA (US);
Douglas Van Den Broeke, Sunnyvale, CA (US);
Jang Fung Chen, Cupertino, CA (US);
Robert John Socha, Campbell, CA (US);
Xuelong Shi, San Jose, CA (US);
Douglas Van Den Broeke, Sunnyvale, CA (US);
Jang Fung Chen, Cupertino, CA (US);
ASML Masktools B.V., , NL;
Abstract
Disclosed concepts include a method of optimizing an illumination profile of a pattern to be formed in a surface of a substrate. Illumination is optimized by defining a transmission cross coefficient ('TCC') function determined in accordance with an illumination pupil and a projection pupil corresponding to an illuminator, representing at least one resolvable feature of a mask to be printed on the substrate by at least one impulse function, and creating an interference map of a predetermined order based on the at least one impulse function and the TCC function, wherein the interference map represents the at least one resolvable feature to be printed on the substrate and areas of destructive interference.