This inventor holds 35 USPTO granted patents and 2 published patent applications and 3 EPO patents, primarily in Optical Lithography. Top assignees: Asml Masktools B.v., Asml Holding N.v., Asml Netherlands B.v.. Active years: 2003-2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
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Years Active: 2003-2014
Areas of Expertise:
Title: Innovator Spotlight: Douglas Van Den Broeke
Introduction: Douglas Van Den Broeke is a prolific inventor based in Sunnyvale, CA, with an impressive portfolio of 35 patents to his name. His groundbreaking work in the field of lithography has revolutionized the way we approach multiple-exposure imaging processes.
Latest Patents: Among his latest patents is the "Method, program product and apparatus for performing double exposure lithography," which introduces a novel approach to generating complementary masks for use in lithographic imaging. This method optimizes phase shifts and percentage transmissions for critical features, leading to enhanced image resolution.
Another notable patent is the "Method and apparatus for performing dark field double dipole lithography (DDL)," which simplifies the generation of complementary masks for dark field double dipole imaging processes. By optimizing biases and incorporating assist features, this method ensures high-quality imaging results.
Career Highlights: Douglas Van Den Broeke has made significant contributions to the field of lithography through his work at companies like ASML MaskTools B.V. His innovative solutions have advanced the capabilities of lithographic imaging technologies, paving the way for new possibilities in semiconductor manufacturing.
Collaborations: Throughout his career, Douglas has collaborated with industry experts such as Jang Fung Chen and Thomas Laidig. Together, they have pushed the boundaries of lithography technology, driving innovation and excellence in the field.
Conclusion: Douglas Van Den Broeke's passion for innovation and his relentless pursuit of excellence have established him as a leading figure in the world of lithography. His patents and collaborations are a testament to his dedication to advancing technology and shaping the future of imaging processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile