Sunnyvale, CA, United States of America

Douglas Van Den Broeke

USPTO Granted Patents = 35 

 

Average Co-Inventor Count = 3.4

ph-index = 11

Forward Citations = 282(Granted Patents)


Company Filing History:


Years Active: 2003-2014

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35 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Douglas Van Den Broeke

Introduction: Douglas Van Den Broeke is a prolific inventor based in Sunnyvale, CA, with an impressive portfolio of 35 patents to his name. His groundbreaking work in the field of lithography has revolutionized the way we approach multiple-exposure imaging processes.

Latest Patents: Among his latest patents is the "Method, program product and apparatus for performing double exposure lithography," which introduces a novel approach to generating complementary masks for use in lithographic imaging. This method optimizes phase shifts and percentage transmissions for critical features, leading to enhanced image resolution.

Another notable patent is the "Method and apparatus for performing dark field double dipole lithography (DDL)," which simplifies the generation of complementary masks for dark field double dipole imaging processes. By optimizing biases and incorporating assist features, this method ensures high-quality imaging results.

Career Highlights: Douglas Van Den Broeke has made significant contributions to the field of lithography through his work at companies like ASML MaskTools B.V. His innovative solutions have advanced the capabilities of lithographic imaging technologies, paving the way for new possibilities in semiconductor manufacturing.

Collaborations: Throughout his career, Douglas has collaborated with industry experts such as Jang Fung Chen and Thomas Laidig. Together, they have pushed the boundaries of lithography technology, driving innovation and excellence in the field.

Conclusion: Douglas Van Den Broeke's passion for innovation and his relentless pursuit of excellence have established him as a leading figure in the world of lithography. His patents and collaborations are a testament to his dedication to advancing technology and shaping the future of imaging processes.

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