The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2012
Filed:
Jun. 22, 2006
Jang Fung Chen, Cupertino, CA (US);
Duan-fu Stephen Hsu, Fremont, CA (US);
Douglas Van Den Broeke, Sunnyvale, CA (US);
Thomas Laidig, Point Richmond, CA (US);
Jang Fung Chen, Cupertino, CA (US);
Duan-Fu Stephen Hsu, Fremont, CA (US);
Douglas Van Den Broeke, Sunnyvale, CA (US);
Thomas Laidig, Point Richmond, CA (US);
ASML Masktools B.V., Veldhoven, NL;
Abstract
A method for forming exposure masks for imaging a target pattern having features to be imaged on a substrate in a multi-exposure process. The method includes the steps of generating a set of decomposition rules defining whether a given feature of the target pattern is assigned to a first exposure mask or a second exposure mask; applying the decomposition rules to each of the features in the target pattern so as to assign each of the features in the target pattern to one of the first exposure mask or second exposure mask; and generating the first exposure mask and the second exposure mask containing the respective features assigned to each mask.