The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2011

Filed:

Aug. 14, 2007
Applicants:

Xuelong Shi, San Jose, CA (US);

Jang Fung Chen, Cupertino, CA (US);

Douglas Van Den Broeke, Sunnyvale, CA (US);

Inventors:

Xuelong Shi, San Jose, CA (US);

Jang Fung Chen, Cupertino, CA (US);

Douglas Van Den Broeke, Sunnyvale, CA (US);

Assignee:

ASML Masktools B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G10K 7/06 (2006.01); H04N 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of determining calibration test patterns to be utilized to calibrate a model for simulating the imaging performance of an optical imaging system. The method includes the steps of defining design rules associated with a given imaging process; defining a model equation representing the imaging performance of the optical imaging system; determining a boundary of an imaging signal space based on the design rules; selecting calibration patterns based on the boundary of the imaging signal space such that the calibration patterns are on the boundary or within the boundary of the imaging signal space; and storing the selected calibration test patterns, where the calibration test patterns are utilized to calibrate the model for simulating the imaging performance of the optical imaging system.


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