The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2011
Filed:
Aug. 10, 2006
Jang Fung Chen, Cupertino, CA (US);
Duan-fu Stephen Hsu, Fremont, CA (US);
Douglas Van Den Broeke, Sunnyvale, CA (US);
Jung Chul Park, Pleasanton, CA (US);
Thomas Laidig, Point Richmond, CA (US);
Jang Fung Chen, Cupertino, CA (US);
Duan-Fu Stephen Hsu, Fremont, CA (US);
Douglas Van Den Broeke, Sunnyvale, CA (US);
Jung Chul Park, Pleasanton, CA (US);
Thomas Laidig, Point Richmond, CA (US);
ASML Masktools B.V., AH Veldhoven, NL;
Abstract
A method of generating a mask for printing a pattern including a plurality of features. The method includes the steps of obtaining data representing the plurality of features; and forming at least one of the plurality of features by etching a substrate to form a mesa and depositing a chrome layer over the entire upper surface of the mesa, where said mesa has a predetermined height.