Robert John Socha

USPTO Granted Patents = 35 (Patent Applications = 3)

EPO Patents = 2

Average Co-Inventor Count = 1.6

ph-index = 10

Forward Citations = 260(Granted Patents)

Location History:

San Jose, CA (US) (2020 - 2021)
Campbell, CA (US) (2005 - 2024)

Company Filing History:

21 out of 4,883

Asml Netherlands B.v.

Years Active: 2005-2024

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35 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11966166 - Measurement apparatus and a method for determining a substrate grid (2024-04-23),

2. 11079684 - Measurement apparatus and a method for determining a substrate grid (2021-08-03),

3. 10996571 - Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured (2021-05-04),

4. 10670975 - Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured (2020-06-02),

5. 10670973 - Coloring aware optimization (2020-06-02),

6. 10657641 - Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction orders (2020-05-19),

7. 10437158 - Metrology by reconstruction (2019-10-08),

8. 10417359 - Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement (2019-09-17),

9. 10132763 - Inspection method and apparatus, lithographic system and device manufacturing method (2018-11-20),

10. 10054862 - Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method (2018-08-21),

11. 9053280 - Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditions (2015-06-09),

12. 8751979 - Determining the gradient and Hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO) (2014-06-10),

13. 8730452 - Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction orders (2014-05-20),

14. 8640058 - Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process (2014-01-28),

15. 8612900 - Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditions (2013-12-17),

Title: Innovator Spotlight: Robert John Socha - Revolutionizing Lithographic Technology

Introduction:

Robert John Socha, a prolific inventor based in Campbell, CA, is making waves in the field of lithographic technology with a remarkable 35 patents to his name. His cutting-edge advancements in measurement apparatus and substrate grid determination are reshaping the landscape of semiconductor fabrication.

Latest Patents:

One of Socha's latest patents involves a groundbreaking measurement apparatus and method for determining a substrate grid, essential for understanding substrate deformation prior to lithographic exposure. By obtaining position and asymmetry data for key features on the substrate, Socha's innovation enables precise control of the exposure process in lithographic apparatus, facilitating the fabrication of intricate features with unparalleled accuracy.

Career Highlights:

With a career marked by innovation and excellence, Robert John Socha has lent his expertise to renowned companies in the industry. Notably, he has contributed significantly to the research and development efforts at ASML Netherlands B.V. and ASML Masktools B.V., where his inventive spirit has propelled the advancement of lithographic technologies.

Collaborations:

Collaboration lies at the heart of Socha's success, as he has worked closely with visionary colleagues such as Donis George Flagello and Xuelong Shi. Together, they have pushed the boundaries of technology, creating synergies that have led to groundbreaking solutions in the realm of lithography.

Conclusion:

In conclusion, Robert John Socha stands as a visionary inventor at the forefront of lithographic innovation. His dedication to pushing the boundaries of technology and his collaborative spirit have not only earned him 35 patents but also solidified his position as a key player in revolutionizing semiconductor fabrication processes. Watch out for more groundbreaking inventions from this luminary in the future.

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3 patents pending:

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2 patents (EPO):

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