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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10417359 B1

PDFFull Text
Date of Patent:
Sep. 17, 2019

Filed:

Dec. 14, 2016

Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement

Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Robert John Socha, Campbell, CA (US);

Thomas I. Wallow, San Carlos, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:

Pillsbury Winthrop Shaw Pittman LLP

Primary Examiner:

Mark R Gaworecki

Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06N 20/00 (2019.01); G01N 21/47 (2006.01); G03F 7/20 (2006.01); G06F 17/18 (2006.01); G06N 7/00 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5009 (2013.01); G01N 21/4785 (2013.01); G03F 7/2002 (2013.01); G03F 7/2004 (2013.01); G03F 7/70616 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G06F 17/18 (2013.01); G06N 7/005 (2013.01); G06N 20/00 (2019.01); G01N 2201/127 (2013.01); G06F 2217/16 (2013.01);
Abstract

A process of calibrating a model, the process including: obtaining training data including: scattered radiation information from a plurality of structures, individual portions of the scattered radiation information being associated with respective process conditions being characteristics of a patterning process of the individual structures; and calibrating a model with the training data by determining a ratio relating a change in one of the process characteristics to a corresponding change in scattered radiation information.

Find Patent Forward Citations

Socha, Robert. (2019). Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement (U.S. Patent No. 10417359). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10417359

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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