The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2009
Filed:
Nov. 05, 2004
Stephen D. Hsu, Fremont, CA (US);
Jang Fung Chen, Cupertino, CA (US);
Xuelong Shi, San Jose, CA (US);
Douglas Van Den Broeke, Sunnyvale, CA (US);
Stephen D. Hsu, Fremont, CA (US);
Jang Fung Chen, Cupertino, CA (US);
Xuelong Shi, San Jose, CA (US);
Douglas Van Den Broeke, Sunnyvale, CA (US);
ASML Masktools B.V., AH Veldhoven, NL;
Abstract
A method of generating a mask for use in a photolithography process. The method includes the steps of determining a target mask pattern having a plurality of features to be imaged and an illumination system to be utilized to image the mask; identifying a critical pitch within the target pattern and optimizing illumination settings of the illumination system for imaging the critical pitch; identifying a forbidden pitch within the target pattern; and modifying the transmittance of the features having a pitch equal to or substantially equal to the forbidden pitch such that the exposure latitude of the features equal to or substantially equal to the forbidden pitch is increased.