The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2008
Filed:
Sep. 14, 2005
Michael Hsu, Hsin-chu, TW;
Thomas Laidig, Point Richmond, CA (US);
Kurt E. Wampler, Sunnyvale, CA (US);
Duan-fu Stephen Hsu, Fremont, CA (US);
Xuelong Shi, San Jose, CA (US);
Michael Hsu, Hsin-chu, TW;
Thomas Laidig, Point Richmond, CA (US);
Kurt E. Wampler, Sunnyvale, CA (US);
Duan-Fu Stephen Hsu, Fremont, CA (US);
Xuelong Shi, San Jose, CA (US);
ASML Masktools B.V., Veldhoven, NL;
Abstract
A method of generating a mask for use in an imaging process pattern. The method includes the steps of: (a) obtaining a desired target pattern having a plurality of features to be imaged on a substrate; (b) simulating a wafer image utilizing the target pattern and process parameters associated with a defined process; (c) defining at least one feature category; (d) identifying features in the target pattern that correspond to the at least one feature category, and recording an error value for each feature identified as corresponding to the at least one feature category; and (e) generating a statistical summary which indicates the error value for each feature identified as corresponding to the at least one feature category.