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For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

Kurt E Wampler

This inventor holds 27 USPTO granted patents, primarily in Optical Lithography. Top assignees: Asml Masktools B.v., Asml Masktools Netherlands B.v., Asml Netherlands B.v.. Active years: 1997-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kurt E Wampler. Retrieved from https://idiyas.com/inventor/kurt-e-wampler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27

% Patents Active = 66.7

Average Co-Inventor Count = 3.7

ph-index = 11

Forward Citations = 921(Granted Patents)


Company Filing History:

goldMedal18 out of 87 
 
Asml Masktools B.v.
 patents
silverMedal5 out of 9 
 
Asml Masktools Netherlands B.v.
 patents
bronzeMedal2 out of 5,076 
 
Asml Netherlands B.v.
 patents
4. 2 out of 110 
 
Microunity Systems Engineering, Inc.
 patents

Years Active: 1997-2021

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Areas of Expertise:
Optical Proximity Correction
Phase-Shift Mask
Lithography Patterning
Model-Based Layout
Assist Features
Two Dimensional Calibration
Full-Chip Reliability
Scattering Bar OPC
Chromeless Phase Lithography
Deep Sub-Wavelength
Fine Feature Tuning
27 patents (USPTO):Explore Patents
1. 11022894 - Rule-based deployment of assist features (2021-06-01),
2. 10331039 - Rule-based deployment of assist features (2019-06-25),
3. 8039180 - Scattering bar OPC application method for sub-half wavelength lithography patterning (2011-10-18),
4. 7998355 - CPL mask and a method and program product for generating the same (2011-08-16),
5. 7985515 - Method and apparatus for performing model-based layout conversion for use with dipole illumination (2011-07-26),
6. 7892707 - Scattering bar OPC application method for sub-half wavelength lithography patterning (2011-02-22),
7. 7820341 - Method of two dimensional feature model calibration and optimization (2010-10-26),
8. 7774736 - Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography (2010-08-10),
9. 7666554 - Method and apparatus for performing model-based layout conversion for use with dipole illumination (2010-02-23),
10. 7550235 - Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography (2009-06-23),
11. 7549140 - Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography (2009-06-16),
12. 7485396 - Scattering bar OPC application method for sub-half wavelength lithography patterning (2009-02-03),
13. 7434195 - Method for performing full-chip manufacturing reliability checking and correction (2008-10-07),
14. 7376930 - Method, program product and apparatus for generating assist features utilizing an image field map (2008-05-20),
15. 7354681 - Scattering bar OPC application method for sub-half wavelength lithography patterning (2008-04-08),

Title: The Innovative Journey of Kurt E. Wampler

Introduction: Kurt E. Wampler, a visionary inventor based in Sunnyvale, CA, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Kurt E. Wampler holds several patents in various technological domains, showcasing his versatility and creativity in innovation.

Career Highlights: With a career spanning over two decades, Kurt E. Wampler has been at the forefront of technological advancements, consistently pushing the boundaries of what is possible. His dedication to innovation has led to the development of cutting-edge solutions that have revolutionized industries.

Collaborations: Throughout his career, Kurt E. Wampler has collaborated with leading tech companies, research institutions, and universities to further his inventions and bring them to market. His ability to work in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: Kurt E. Wampler's passion for innovation, coupled with his technical expertise, has established him as a prominent figure in the world of inventors. His relentless pursuit of excellence continues to inspire future generations of innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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