Company Filing History:
Years Active: 2007-2010
Title: Uwe Hollerbach: Innovator in Photolithographic Systems
Introduction
Uwe Hollerbach is a notable inventor based in Franklin, MA, who has made significant contributions to the field of photolithography. With a total of five patents to his name, he has developed innovative methods and apparatuses that enhance the precision and efficiency of printing features on substrates.
Latest Patents
Hollerbach's latest patents include an "Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems." This method focuses on minimizing rippling of features when imaged on a substrate surface using a mask. The process involves determining deviations between design representations and modifying the design based on evaluations at multiple points. Another significant patent is the "Method of two-dimensional feature model calibration and optimization." This method outlines a systematic approach for generating photolithography masks that accurately transfer patterns onto substrates, ensuring high-quality imaging performance.
Career Highlights
Uwe Hollerbach is currently employed at ASML Masktools B.V., where he continues to push the boundaries of photolithographic technology. His work has been instrumental in advancing the capabilities of imaging systems used in various applications.
Collaborations
Hollerbach collaborates with talented professionals in his field, including Thomas Laidig and Jang Fung Chen. Their combined expertise contributes to the innovative projects at ASML Masktools B.V.
Conclusion
Uwe Hollerbach's contributions to photolithography through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence the development of advanced imaging technologies.