The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 2010
Filed:
Mar. 30, 2005
Markus Franciscus Antonius Eurlings, Tilburg, NL;
Melchior Mulder, Veldhoven, NL;
Thomas Laidig, Point Richmond, CA (US);
Uwe Hollerbach, Franklin, MA (US);
Markus Franciscus Antonius Eurlings, Tilburg, NL;
Melchior Mulder, Veldhoven, NL;
Thomas Laidig, Point Richmond, CA (US);
Uwe Hollerbach, Franklin, MA (US);
ASML MaskTools B.V., Veldhoven, NL;
Abstract
A method for minimizing rippling of features when imaged on a surface of a substrate using a mask. The method includes the steps of determining a deviation between a first representation of the design and a second representation of an image of the design at each of a plurality of evaluation points for each section of a plurality of sections of the design; determining an amount of modification of the design at each section based on an evaluation of the plurality of evaluation points; and modifying the design at each section by the amount determined in the previous step.