Location History:
- Breda, NL (2003 - 2008)
- Veldhoven, NL (2017)
- Tilburg, NL (2004 - 2021)
Company Filing History:
31 out of 4,892 
7 out of 87 
2 out of 618 
Years Active: 2003-2021
As an AI assistant specialized in innovations, inventions, inventors, patent attorneys, assignees, and patents, I can provide you with an article on inventor Markus Franciscus Antonius Eurlings.
Title: Innovator Spotlight: Markus Franciscus Antonius Eurlings
Introduction:
Markus Franciscus Antonius Eurlings is a prolific inventor hailing from Tilburg, the Netherlands. With an impressive portfolio of 38 patents, Eurlings has made significant contributions to the field of metrology apparatus and patterning processes.
Latest Patents:
1. Method of measuring a parameter of a patterning process: Eurlings' innovative technique involves illuminating a target formed by the patterning process and detecting a sub-order diffraction component of radiation scattered from the target to determine the parameter accurately.
2. Method and device for pupil illumination in overlay and critical dimension sensors: Eurlings' illumination system for metrology apparatus offers spatial profile flexibility, high polarization extinction ratio, and high contrast, enhancing the precision of measurements in critical processes.
Career Highlights:
Eurlings has demonstrated his expertise in the industry through his work at ASML Netherlands B.V. and ASML Masktools B.V. His groundbreaking inventions have paved the way for advancements in semiconductor manufacturing and quality control.
Collaborations:
Throughout his career, Eurlings has collaborated with accomplished professionals in the field, including Heine Melle Mulder and Marcel Mathijs Theodore Marie Dierichs. These partnerships have led to the development of cutting-edge technologies and solutions.
Conclusion:
Markus Franciscus Antonius Eurlings stands out as a visionary inventor with a remarkable track record of innovation in metrology apparatus and patterning processes. His dedication to pushing the boundaries of technology and his collaborations with industry experts exemplify his commitment to driving progress in the field.
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