The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2019
Filed:
Jul. 18, 2017
Asml Netherlands B.v., Veldhoven, NL;
Heine Melle Mulder, Veldhoven, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Adrianus Franciscus Petrus Engelen, Waalre, NL;
Markus Franciscus Antonius Eurlings, Tilburg, NL;
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
Paul Van Der Veen, Waalre, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Wilfred Edward Endendijk, Steensel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.