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For the Inventor, By the Inventor

Waalre, Netherlands

Paul Van Der Veen

This inventor holds 25 USPTO granted patents and 3 EPO patents, primarily in Lithographic Technology. Top assignees: Asml Netherlands B.v., Asml Holding N.v., Carl Zeiss Semiconductor Manufacturing Technologies Ag. Active years: 2002-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul Van Der Veen. Retrieved from https://idiyas.com/inventor/paul-van-der-veen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25

% Patents Active = 60.0

 

Average Co-Inventor Count = 2.4

ph-index = 5

Forward Citations = 110(Granted Patents)


Location History:

  • Eindhoven, NL (2002 - 2009)
  • Waalre, NL (2007 - 2019)

Company Filing History:

goldMedal24 out of 5,070 
 
Asml Netherlands B.v.
 patents
silverMedal2 out of 629 
 
Asml Holding N.v.
 patents
bronzeMedal1 out of 22 
 
Carl Zeiss Semiconductor Manufacturing Technologies Ag
 patents
where one patent can have more than one assignee

Years Active: 2002-2019

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Areas of Expertise:
Lithographic Apparatus
Illumination System
Device Manufacturing
Reticle Assembly
Radiation Source
Optical Integrator
Fluorescence Filter
Pulse Modifier
Gas Supply System
Computer Program
Integrated Circuit
25 patents (USPTO):Explore Patents
1. 10222703 - Lithographic apparatus and method (2019-03-05),
2. 9778575 - Lithographic apparatus and method (2017-10-03),
3. 9645510 - Method of controlling a radiation source and lithographic apparatus comprising the radiation source (2017-05-09),
4. 9250536 - Lithographic apparatus and method (2016-02-02),
5. 9140999 - Reticle assembly, a lithographic apparatus, the use in a lithographic process, and a method to project two or more image fields in a single scanning movement of a lithographic process (2015-09-22),
6. 8982319 - Lithographic apparatus and method (2015-03-17),
7. 8937706 - Lithographic apparatus and method (2015-01-20),
8. 8885144 - Illumination system and lithographic apparatus (2014-11-11),
9. 8625199 - Pulse modifier with adjustable etendue (2014-01-07),
10. 8432529 - Lithographic apparatus and monitoring method (2013-04-30),
11. 8004770 - Pulse modifier with adjustable etendue (2011-08-23),
12. 7508487 - Lithographic apparatus, device manufacturing method, and device manufactured thereby (2009-03-24),
13. 7476491 - Lithographic apparatus, gas supply system, method for purging, and device manufacturing method and device manufactured thereby (2009-01-13),
14. 7368732 - Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program (2008-05-06),
15. 7315351 - Lithographic apparatus, device manufacturing method and device manufactured therewith (2008-01-01),

As an AI assistant specializing in innovations, inventions, inventors, patent attorneys, assignees and patents, I can help you with that request. Here is the article about inventor Paul Van Der Veen:

Title: Exploring the Inventive Mind of Paul Van Der Veen

Introduction:

Paul Van Der Veen, a prolific inventor hailing from Waalre, NL, is a visionary figure in the field of technological advancements. With an impressive portfolio of 21 patents under his belt, his innovative spirit knows no bounds.

Latest Patents:

Among his latest patents is a groundbreaking Lithographic apparatus and method. This device manufacturing method revolutionizes the conditioning of a beam of radiation using an illumination system. By intricately controlling an array of individually controllable elements, Paul's method yields a desired illumination mode, paving the way for precise patterning on substrates.

Career Highlights:

Paul Van Der Veen has left an indelible mark on the industry through his work with renowned companies such as ASML Netherlands B.V. and ASML Holding N.V. His contributions have significantly shaped the technological landscape, especially in the realm of lithography and device manufacturing.

Collaborations:

Throughout his illustrious career, Paul has collaborated with esteemed colleagues such as Heine Melle Mulder and Johannes Jacobus Matheus Baselmans. Together, they have pushed the boundaries of innovation and set new standards in the field.

Conclusion:

In conclusion, Paul Van Der Veen's relentless pursuit of innovation and his remarkable contributions to the technological domain underscore his legacy as a true trailblazer. His inventive prowess continues to inspire the next generation of inventors, driving progress and shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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