The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2014

Filed:

Jun. 30, 2011
Applicants:

Adel Joobeur, Milford, CT (US);

Oscar Franciscus Jozephus Noordman, Eindhoven, NL;

Paul Van Der Veen, Waalre, NL;

Arun Mahadevan Venkataraman, Norwalk, CT (US);

Inventors:

Adel Joobeur, Milford, CT (US);

Oscar Franciscus Jozephus Noordman, Eindhoven, NL;

Paul Van Der Veen, Waalre, NL;

Arun Mahadevan Venkataraman, Norwalk, CT (US);

Assignees:

ASML Holding N.V., Veldhoven, NL;

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.


Find Patent Forward Citations

Loading…