The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2009
Filed:
Nov. 24, 2003
Johannes Catharinus Hubertus Mulkens, Maastricht, NL;
Paul Van Der Veen, Eindhoven, NL;
Willem Van Schaik, Den Bosch, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Levinus Pieter Bakker, Helmond, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Heine Melle Mulder, Eindhoven, NL;
Johannes Catharinus Hubertus Mulkens, Maastricht, NL;
Paul Van Der Veen, Eindhoven, NL;
Willem Van Schaik, Den Bosch, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Levinus Pieter Bakker, Helmond, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Heine Melle Mulder, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.