Veldhoven, Netherlands

Heine Melle Mulder

This inventor holds 36 USPTO granted patents and 6 published patent applications and 6 EPO patents, primarily in Lithography Technology. Top assignees: Asml Netherlands B.v., Asml Holding N.v., Carl Zeiss Smt Gmbh. Active years: 2004-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Heine Melle Mulder. Retrieved from https://idiyas.com/inventor/heine-melle-mulder

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 36 

% Patents Active = 44.4

 

Average Co-Inventor Count = 3.4

ph-index = 6

Forward Citations = 235(Granted Patents)


Location History:

  • Eindhoven, NL (2004 - 2009)
  • Veldhoven, NL (2008 - 2019)

Company Filing History:


Years Active: 2004-2026

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Areas of Expertise:
EUV Source Chamber
Gas Flow Regime
Radiation Modulator
Illumination System
Device Manufacturing
Optical Element
Mirror Array
Stage Apparatus
Polarization Tuning
Uniformity Correction
Optical Attenuator
Stray Radiation
36 patents (USPTO):Explore Patents

Title: Heine Melle Mulder: Pioneering Innovation in Science and Technology

Introduction:

Heine Melle Mulder is a visionary inventor based in Veldhoven, Netherlands, with a passion for creating groundbreaking solutions to challenging technological problems. His relentless pursuit of innovation has cemented his reputation as a trailblazer in the field of science and technology, inspiring generations of inventors and researchers to push the boundaries of what is achievable.

Latest Patents:

Heine Melle Mulder holds an impressive 35 patents, showcasing his expertise in developing cutting-edge technologies. One of his latest patents includes a topography measurement system designed to accurately measure surface features on substrates. Additionally, he has patented an EUV source chamber and gas flow regime for lithographic apparatus, emphasizing his commitment to revolutionizing the semiconductor industry.

Career Highlights:

Throughout his illustrious career, Heine Melle Mulder has made significant contributions to leading companies in the industry. He has worked at ASML Netherlands B.V., a renowned semiconductor equipment manufacturer, where he played a key role in developing innovative technologies for the semiconductor lithography market. He has also been associated with Carl Zeiss SMT GmbH, a prominent supplier of optical systems, further demonstrating his impact on the industry.

Collaborations:

Heine Melle Mulder has collaborated with esteemed professionals in the field, including Markus Franciscus Antonius Eurlings and Hendrikus Robertus Marie Van Greevenbroek. These collaborations have led to the development of groundbreaking technologies and have expanded the boundaries of innovation in science and technology.

Conclusion:

In conclusion, Heine Melle Mulder's pioneering spirit and dedication to innovation have positioned him as a visionary inventor in the realm of science and technology. His remarkable body of work continues to shape the industry and inspire future generations to strive for excellence in creating transformative solutions to complex technological challenges.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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