The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2015

Filed:

Mar. 18, 2011
Applicants:

Heine Melle Mulder, Veldhoven, NL;

Steven George Hansen, Phoenix, AZ (US);

Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;

Markus Deguenther, Aalen, DE;

Inventors:

Heine Melle Mulder, Veldhoven, NL;

Steven George Hansen, Phoenix, AZ (US);

Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;

Markus Deguenther, Aalen, DE;

Assignees:

ASML NETHERLANDS B.V., Veldhoven, NL;

CARL ZEISS SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70116 (2013.01); G03F 7/70566 (2013.01);
Abstract

An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.


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