The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2017
Filed:
Jan. 24, 2013
Asml Netherlands B.v., Veldhoven, NL;
Wouter Dick Koek, Zoetermeer, NL;
Arno Jan Bleeker, Westerhoven, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Heine Melle Mulder, Veldhoven, NL;
Erwin John Van Zwet, Pijnacker, NL;
Dries Smeets, Hasselt, BE;
Robert Paul Ebeling, Zoetermeer, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.