Zoetermeer, Netherlands

Wouter Dick Koek

This inventor holds 2 USPTO granted patents and 4 published patent applications. Top assignee: Asml Netherlands B.v.. Active years: 2017-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wouter Dick Koek. Retrieved from https://idiyas.com/inventor/wouter-dick-koek

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 7.9

ph-index = 1


Company Filing History:


Years Active: 2017-2026

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Wouter Dick Koek

Introduction:

Wouter Dick Koek, a talented inventor based in Zoetermeer, NL, has been making waves in the field of technology with his groundbreaking creations. With a keen eye for detail and a passion for innovation, Koek has solidified his place among the brightest minds in the industry.

Latest Patents:

Koek's most recent patent showcases his ingenuity in the development of a device, lithographic apparatus, a method for guiding radiation, and a device manufacturing method. This invention features a waveguide made of a continuous transparent material, along with a cooling system to enhance its functionality.

Career Highlights:

Currently employed at ASML Netherlands B.V., Koek has been actively involved in pushing the boundaries of technology. His in-depth knowledge and expertise have played a crucial role in the success of the company's innovative projects.

Collaborations:

Throughout his career, Koek has had the pleasure of collaborating with esteemed colleagues such as Arno Jan Bleeker and Erik Roelof Loopstra. Together, they have worked on cutting-edge technological advancements that have garnered attention worldwide.

Conclusion:

In conclusion, Wouter Dick Koek's dedication to the field of technology and his unwavering commitment to innovation make him a standout figure in the industry. His remarkable contributions continue to shape the future of technology, leaving a lasting impact on the world of inventions and patents.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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