Hasselt, Belgium

Dries Smeets


Average Co-Inventor Count = 7.1

ph-index = 1


Company Filing History:


Years Active: 2017-2020

Loading Chart...
3 patents (USPTO):

Title: Unveiling the Innovations of Dries Smeets: A Visionary in EUV Lithography

Introduction:

Meet Dries Smeets, a brilliant inventor hailing from Hasselt, Belgium, who has made significant strides in the field of Extreme Ultraviolet (EUV) lithography. With a total of three patents under his belt, Smeets is reshaping the landscape of optical systems for advanced lithographic processes.

Latest Patents:

One of Smeets' groundbreaking patents is the "Optical element and optical system for EUV lithography, and method for treating such an optical element." This patent introduces an innovative optical element design with protective layers that act as a diffusion barrier for hydrogen, enhancing the element's performance in EUV lithography processes.

Another notable patent by Smeets is the "Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method." This invention revolutionizes radiation modulation in lithography systems, offering a novel approach to modulating radiation for precise output beam control.

Career Highlights:

Throughout his career, Smeets has made significant contributions while working at prestigious companies such as ASML Netherlands B.V. and Carl Zeiss SMT GmbH. His expertise and innovative spirit have been instrumental in advancing cutting-edge technologies in the field of lithography.

Collaborations:

Smeets has collaborated with talented individuals in his field, including Arno Jan Bleeker and Heine Melle Mulder, further enriching his innovative endeavors. Together, they have pushed the boundaries of optical systems and radiation modulation, paving the way for enhanced lithographic processes.

Conclusion:

In conclusion, Dries Smeets stands out as a visionary inventor who continues to push the boundaries of innovation in EUV lithography. His patents and contributions reflect his dedication to advancing optical systems and radiation modulation for the benefit of the industry as a whole. Smeets' inventive spirit and collaborative efforts underscore his invaluable role in shaping the future of lithography technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…